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Oxide semicon tech to revolutionize displays

06 Jun 2012

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Sharp Corp. and Semiconductor Energy Laboratory Co. Ltd have announced a new oxide semiconductor (IGZO) technology with high crystalline. According to the companies, the material will enable even higher resolutions, lower power consumption and higher performance touch screens, as well as narrower bezel widths for LCD display panels used in mobile devices such as smartphones.

The jointly developed IGZO technology imparts crystallinity in an oxide semiconductor composed of indium (In), gallium (Ga) and zinc (Zn). Compared to current amorphous IGZO semiconductors, it enables even smaller thin-film transistors to be achieved and provides higher performance. This new material is expected to be adopted for LCD displays for mobile devices such as smartphones where the trend toward higher screen resolutions is growing increasingly strong.

Further, the technology can also be adapted for use in organic EL displays which hold out high expectations for the future. Although challenges to commercialization remain in terms of both service life and production, the two companies will continue to push ahead with R&D in anticipation of future market needs.




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