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TSMC, Synopsys collaborate on 16nm FinFET design

10 Sep 2013

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Taiwan Semiconductor Manufacturing Company (TSMC) has certified Synopsys' Laker custom design solution for the TSMC 16nm (nm) FinFET process Design Rule Manual (DRM) V0.5. TSMC also rolled out its 16nm interoperable process design kit (iPDK). Compliance with the iPDK standard enables the Laker tool to provide access to 180nm to 16nm process technologies owned by TSMC.

Laker enhancements for 16nm layout include an extensive set of new features for FinFET devices, including fin grid pattern snapping, fin display and interactive FinFET rule checking. Laker's built-in double-pattern checking has been enhanced to support pre-colouring and colour density checking. Laker support for MEOL layers includes contactless connectivity, unidirectional layer rules and enhancements to support 16nm guard rings. Laker has also been enhanced to support continuous diffusion (CNOD) and poly over diffusion edge (PODE) abutment rules used in the TSMC 16-nm V0.5 iPDK.




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