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TSMC certifies Mentor Graphics LFD signoff litho checker

17 Sep 2012

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TSMC has certified the Calibre LFD (Litho Friendly Design) signoff lithography checking tool for use in its 20nm manufacturing process, according to EDA firm Mentor Graphics.

Mentor Graphics said fast and accurate litho checking is an essential capability to identify hotspots and to verify that designs have sufficient process window.

Problem features that cannot be fixed at the mask stage using optical proximity correction (OPC) can be identified in the design phase and eliminated before tapeout with Calibre LFD. This helps to avoid litho-related manufacturing issues and late stage delays resulting from re-design. Pre-tapeout litho checking has been an industry best practice since the 40nm and 28nm processes, and it is now expanded further into the advanced 20nm process.

Mentor Graphics collaborated closely with TSMC from the start of their LPC development project to integrate Calibre LFD with TSMC's Unified Design for Manufacturing (DFM) engine to deliver a litho process checking (LPC) simulation flow. At 20nm, LPC helps ensure that advanced designs incorporating double patterning can meet DFM requirements and minimize litho-related hotspots.

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