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Sol'n enables in-line metrology for key device control

16 Aug 2013

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Nanometrics Inc. has revealed that SK Hynix noted significant process control improvement by deploying the Atlas II platform for optical critical dimension (OCD) metrology across its memory device production.

"Nanometrics, with its Atlas II platform, has enabled key yield and performance learning on our DRAM devices," noted a representative of SK Hynix. "Nanometrics continues to be a valuable technology supplier to SK Hynix and the Atlas II platform plays an important role in the production ramp of our next-generation products."

"We have a close collaboration with SK Hynix, and have provided the company metrology solutions across multiple technology generations of memory devices since first introducing our industry-leading NanoDiffract OCD analysis software," said S. Mark Borowicz, SVP of silicon solutions at Nanometrics. "Our Atlas II system, with its advanced technology for in-line process control, has enabled this important customer to quickly identify and address manufacturing steps that impact device performance, and tune key processes to maintain process stability."

The Atlas II is described by the company as a high-performance process control system capable of advanced thin film and OCD metrology, leveraging the performance of Nanometrics' NanoDiffract software for complex structure metrology.

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