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Si2 coalition's OPS v1.1 targeted at EDA vendors

07 Nov 2013

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The Silicon Integration Initiative's OpenPDK Coalition has introduced the Open Process Specification v1.1, which includes data elements needed to automatically create a process design kit (PDK) for EDA vendors. The OPS standard is a formal grammar based on the W3C standard XML Schema Definition (XSD). The newly released OPS will allow companies to utilise the various components of the standard for their own purposes.

OPS v1.0 was targeted at process producing companies, or foundries, to enable study and creation of electronic versions of a Design Rule Manual (eDRM). Its first release was published in January 2013, to gather early feedback on completeness. Positive feedback and valuable suggestions have been rolled into version 1.1. OPS v1.1 is the first release targeted for consideration by EDA vendors. It allows Design Rule Checks (DRC), parameter extraction including the Si2 Open parameter Extraction (OPEX), and technology file creation including the OpenAccess technology database.

OPS 1.1 highlights:

  • connectivity below metal layer one (M1, including local interconnect)
  • manufacturing, DRC & layout database (DB) grids
  • improved enumerations for layers and layer derivations
  • multi patterning support in layers definition for advanced node pattern generation
  • tool mapping/interfaces (from the Si2 tools interface WG)
  • a metal stack connectivity table that includes local interconnect usable by all tools
  • a default set of technology grid settings and optional sets of tool specific grid settings
  • Multi patterning support added several "information attributes" in the OPS to support multi patterning: the "exposition number", the "mask colour", and the "lock status".
  • The OPS XSD provides an enumeration of the backward compatible versions it can be used with. An OPS instance selects the OPS XSD version with which it is compatible. This is part of the XSD validation capabilities of OPS.

"STMicroelectronics has provided a complete example implementation (a full Design Rules Manual example and its complete translation in OPS.xml format) of the Open Process Specification to provide users the understanding of how to exploit the advantages of a single, formal, syntax for describing all of the information necessary to build a PDK," says Gilles Namur, Advanced Process Design Kit Architect of STMicroelectronics, a member company of the OpenPDK. "We are looking forward to future enhancements to achieve the goal of streamlining our extensive PDK development process to cut costs and speed production time. We believe that OPS will considerably enhance communication/data exchange between partners, foundries, and EDA vendors."




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